Document Details

Document Type : Article In Journal 
Document Title :
Macroscale Transformation Optics Enabled by Photoelectrochemical Etching
Macroscale Transformation Optics Enabled by Photoelectrochemical Etching
 
Subject : physics 
Document Language : English 
Abstract : Photoelectrochemical etching of silicon can be used to form lateral refractive index gradients for transformation optical devices. This technique allows the fabrication of macroscale devices with large refractive index gradients. Patterned porous layers can also be lifted from the substrate and transferred to other materials, creating more possibilities for novel devices 
ISSN : 0935-9648 
Journal Name : ADVANCED MATERIALS 
Volume : 27 
Issue Number : 40 
Publishing Year : 1435 AH
2015 AD 
Article Type : Article 
Added Date : Wednesday, August 16, 2017 

Researchers

Researcher Name (Arabic)Researcher Name (English)Researcher TypeDr GradeEmail
D.S BarthBarth, D.S InvestigatorDoctorate 
C GladdenGladden, C ResearcherDoctorate 
A SalandrinoSalandrino, A ResearcherDoctorate 
K O'BrienO'Brien, K ResearcherDoctorate 
ZL YeYe, Zl ResearcherDoctorate 
M MrejenMrejen, M Researcher  
Y WangWang, Y ResearcherDoctorate 
X ZhangZhang, X ResearcherDoctoratexiang@berkeley.edu

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