Document Details

Document Type : Article In Journal 
Document Title :
Fabrication and electrical characterization of CdO/p-Si photosensors
Fabrication and electrical characterization of CdO/p-Si photosensors
 
Subject : physics 
Document Language : English 
Abstract : CdO nanorods were grown by sal-gel technique and the structural properties were analyzed by X-ray diffraction and AFM measurements. CdO films were grown onto p-type silicon substrates. Optical band gap was determined by optical absorption. The optical band gap of the CdO film was changed by Al dopant. Heterojunction diodes based on undoped and aluminum doped CdO/p-Si were fabricated using sol-gel spin-coating technique. The effect of light intensity on junction properties of the diodes was studied. The ideality factor of the diodes were obtained to be 2.30, 2.95, and 2.80, for undoped, 0.1%, and 1.0% for Al doped CdO diodes, respectively. The transient photocurrent results indicate that photocurrent under illumination is higher than the dark current. The on/off ratio values of the diodes were observed to be 5.84, 7.50, and 3.96 for undoped, 0.1%, and 1.0% Al doped CdO respectively. The observed decrease in the capacitance and increase in the conductance with increase in frequency was explained on the basis of interface states. The obtained results indicate that the photoresponse properties of the CdO/p-Si are controlled by Al doping 
ISSN : 0167-9317 
Journal Name : MICROELECTRONIC ENGINEERING 
Volume : 127 
Issue Number : 10 
Publishing Year : 1435 AH
2014 AD
 
Article Type : Article 
Added Date : Sunday, July 30, 2017 

Researchers

Researcher Name (Arabic)Researcher Name (English)Researcher TypeDr GradeEmail
R. H Al OrainyAl Orainy, R. H InvestigatorDoctorater-aloraini@hotmail.com
A.A HendiHendi, A.A ResearcherDoctorate 

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